2003 8th International Symposium on Plasma- and Process-Induced Damage : April 24-25, 2003, Corbeil-Essonnes, France

Gespeichert in:
Hauptverfasser:
Hook, Terence (MitwirkendeR), Eriguchi, Koji (MitwirkendeR), Krishnan, S (MitwirkendeR)
Körperschaften:
International Symposium on Plasma Process-Induced Damage (Corporate Author), International Symposium on Plasma Process-Induced Damage Corbeil-Essonnes, France, IEEE Electron Devices Society (Content Provider)
Format:
Tagungsbericht Elektronisch E-Book
Sprache:
Englisch
Veröffentlicht:
[Place of publication not identified] IEEE 2003
Anmerkungen:
Bibliographic Level Mode of Issuance: Monograph
Anmerkungen:
English
Schlagworte:
Semiconductor wafers > Effect of radiation on > Congresses.
Semiconductors > Congresses.
Plasma radiation > Congresses.
Electrical & Computer Engineering
Engineering & Applied Sciences
Electrical Engineering
Bezugswerke: