Silicon technologies : ion implantation and thermal treatment /

The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

Gespeichert in:
1. Verfasser:
Baudrant, Annie.
Weitere Verfasser:
Baudrant, Annie
Format:
Elektronisch E-Book
Sprache:
Englisch
Veröffentlicht:
London : Hoboken, N.J. : ISTE ; Wiley, 2011.
Ausgabe:
1st edition
Zusammenfassung:
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Umfang:
1 online resource (357 p.)
text file
Anmerkungen:
Description based upon print version of record.
Anmerkungen:
English
Bibliografie:
Includes bibliographical references and index.
ISBN:
9781118601044
1118601041
9781118601143
1118601149
9781118601112
1118601114
9781299187535
1299187536
Schlagworte:
Semiconductor doping.
Ion implantation.
Semiconductors > Heat treatment.
Bezugswerke:
Links: