Characterization in silicon processing : editor, Yale Strusser [and three others] ; design, Christopher Simon ; contributors, Roc Blumenthal [and sixteen others].

This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to disc...

Ausführliche Beschreibung

Gespeichert in:
1. Verfasser:
Strausser, Yale (HerausgeberIn)
Weitere Verfasser:
Blumenthal, Roc (MitwirkendeR)
Format:
Elektronisch E-Book
Sprache:
Englisch
Veröffentlicht:
Stoneham, Massachusetts ; Greenwich, Connecticut : Butterworth-Heinemann : Manning, 1993.
Ausgabe:
1st edition
Zusammenfassung:
This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to discuss typical problems seen throughout that films' history, including characterization tools which are most effectively used to clarifying and solving those problems.
Umfang:
1 online resource (255 p.)
text file
Anmerkungen:
Description based upon print version of record.
Anmerkungen:
English
Bibliografie:
Includes bibliographical references at the end of each chapters and index.
ISBN:
0-08-052342-0
Schlagworte:
Silicon.
Electric conductors.
Semiconductor films.
Surface chemistry.
Bezugswerke:
Links: