Introduction to metrology applications in IC manufacturing

Metrology has grown significantly, especially in semiconductor manufacturing, and such growth necessitates increased expertise. Until now, this field has never had book written from the perspective of an engineer in a modern IC manufacturing and development environment. The topics in this Tutorial T...

Ausführliche Beschreibung

Gespeichert in:
Hauptverfasser:
Bo, Su, Solecky, Eric, Vaid, Alok
Format:
Elektronisch E-Book
Sprache:
Englisch
Veröffentlicht:
2015
Zusammenfassung:
Metrology has grown significantly, especially in semiconductor manufacturing, and such growth necessitates increased expertise. Until now, this field has never had book written from the perspective of an engineer in a modern IC manufacturing and development environment. The topics in this Tutorial Text range from metrology at its most basic level to future predictions and challenges, including measurement methods, industrial applications, fundamentals of traditional measurement system characterization and calibration, measurement system characterization and calibration, semiconductor-specific applications, optical metrology measurement techniques, charged particle measurement techniques, x-ray and in situ metrology, hybrid metrology, and mask making. Includes example spreadsheets of measurement uncertainty analysis--specifically, precision, matching, and relative accuracy
Umfang:
1 online resource (xvii, 167 pages) illustrations
Anmerkungen:
Mode of access: World Wide Web. - System requirements: Adobe Acrobat Reader
Preface -- Acknowledgments -- List of acronyms -- 1. Introduction -- 2. Metrology fundamentals: measurement system characterization and calibration using traditional definitions -- 3. Fundamental metrology: redefining measurement system analysis -- 4. Metrology in the semiconductor IC industry -- 5. Metrology toolsets in IC manufacturing: optical metrology -- 6. Metrology toolsets in IC manufacturing: charged-particle metrology systems -- 7. Metrology toolsets in IC manufacturing: additional metrology systems -- 8. Limitations of metrology techniques and hybrid metrology -- 9. Metrology in mask making -- 10. Perspectives on future challenges and considerations -- Appendix -- Index
Schriftenreihe:
Tutorial texts in optical engineering
ISBN:
9781628416626
9781628418118
Schlagworte:
Integrated circuits / Measurement
Integrated circuits / Design and construction
Links: