Papers from the Third International Workshop on the Measurement and Characterization of Ultra Shallow Doping Profiles in Semiconductors [20 - 22 March 1995, MCNC, Center for Microelectonics, Research Triangle Park, North Carolina]

Gespeichert in:
Weitere Titel:
Papers from the Third International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition: Sources, Process Control, and Diagnostics
1. Verfasser:
Ehrstein, James (HerausgeberIn)
Körperschaften:
International Workshop on the Measurement and Characterization of Ultra Shallow Doping Profiles in Semiconductors Research Triangle Park, NC, International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition: Sources, Process Control, and Diagnostics
Format:
Tagungsbericht Buchkapitel
Sprache:
Englisch
Veröffentlicht:
1996
Bestände:
  • 49L: phyz.j601(2,14,1)
Umfang:
Ill., graph. Darst.
Anmerkungen:
In: Journal of vacuum science & technology. B. - ISSN 0734-211X. - Ser. 2, Vol. 14 (1996),1, S. 191 - 462
Bezugswerke: